Advancing Transition-Metal Dichalcogenide (TMD) Synthesis for CMOS Nanoelectronics

Topic: Advancing TMD Synthesis for CMOS Nanoelectronics

I would like to learn more about the commercialization of site-specific monolayer transition-metal dichalcogenide (TMD) growth for complementary metal-oxide-semiconductor (CMOS-compatible) nanoelectronic devices. Specifically, I am interested in understanding how this selective growth method compares to existing CVD-based TMD synthesis in terms of scalability, cost, and defect control. Additionally, I would like to gain insights into the demand for CMOS-compatible 2D TMD materials, the barriers to adoption in semiconductor manufacturing, and the investment and licensing considerations for scaling up this fabrication technique.

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